Zhang Wei, Moch Laurent, Dubois Marc, Guérin Katia, Giraudet Jérôme, Masin Francis, Hamwi André
Laboratoire des Matériaux Inorganiques (UMR CNRS 6002) Clermont Université 24, Université Blaise Pascal (UBP), Avenue des Landais, 63177 Aubière, France.
J Nanosci Nanotechnol. 2009 Jul;9(7):4496-501. doi: 10.1166/jnn.2009.m83.
This work focuses on the reactivity of carbon nanodiscs and nanocones with respect to pure fluorine gas. The starting materials, as-synthesized without post-treatment, consist of a mixture of nanodiscs (approximately 70% w/w), nanocones (approximately 20% w/w) and amorphous carbons (approximately 10% w/w). In order to investigate their reactivity in pure F2 gas, two experiment sets have been performed: (i) in situ Thermo Gravimetric Analysis under diluted F2 and relative F2 pressure measurements, which highlight the temperature domain for an efficient fluorination, and then, allow the fluorination conditions to be optimized; (ii) the fluorination under pure F2 gas was performed at temperatures ranged between room temperature and 450 degrees C. Ex situ characterization was carried out using 13C and 19F solid state Nuclear Magnetic Resonance and Scanning Electron Microscopy. For the low reaction temperature (up to 300 degrees C), the chemical stability of these kinds of nanocarbons prevents from intensive fluorination. On the other hand, at temperature higher than 300 degrees C, the fluorination is important but competes with the material decomposition. The fluorination mechanism has been established taking into account NMR and SEM data.
这项工作聚焦于碳纳米盘和碳纳米锥与纯氟气的反应活性。未经后处理直接合成的起始材料由纳米盘(约70% w/w)、纳米锥(约20% w/w)和无定形碳(约10% w/w)的混合物组成。为了研究它们在纯F₂气体中的反应活性,进行了两组实验:(i)在稀释的F₂下进行原位热重分析以及相对F₂压力测量,这突出了有效氟化的温度范围,进而能够优化氟化条件;(ii)在纯F₂气体中于室温至450℃的温度范围内进行氟化。使用¹³C和¹⁹F固态核磁共振以及扫描电子显微镜进行非原位表征。对于低反应温度(高达300℃),这类纳米碳的化学稳定性阻止了强烈的氟化。另一方面,在高于300℃的温度下,氟化很重要,但与材料分解相互竞争。已结合核磁共振和扫描电子显微镜数据建立了氟化机理。