School of Chemical and Biological Engineering, Seoul National University, Seoul, 151-744, Korea.
ACS Nano. 2009 Dec 22;3(12):3927-34. doi: 10.1021/nn900914q.
We present a control strategy for the facile placement of densely packed nanomaterial arrays (i.e., nanoparticles and nanorods) on surface reconstructed polystyrene-block-poly(methyl methacrylate) thin film patterns. The surface reconstruction of perpendicularly oriented block copolymer thin films, which were produced by a treatment with selective solvent vapors for both blocks, created the topographical nanopatterns with enough height contrast for nanoparticle deposition without the need for additional selective etching of a single block domain. The deposition method of nanomaterials was also optimized, and densely packed one- and two-dimensional nanomaterials arrays in the grooves of the block copolymer film patterns were fabricated efficiently. Then, we demonstrated that height contrast of the surface reconstructed block copolymer films could be reversed by electron beam irradiation resulting in nanomaterial arrays placed at the mesa phase of the nanopatterns. On the basis of this nanomaterial placement control strategy, dual nanomaterial arrays on a single block copolymer pattern were also realized.
我们提出了一种控制策略，可方便地将密集排列的纳米材料阵列（即纳米颗粒和纳米棒）放置在表面重构的聚苯乙烯-嵌段-聚甲基丙烯酸甲酯薄膜图案上。通过用两种嵌段的选择性溶剂蒸气处理垂直取向的嵌段共聚物薄膜，可以在无需对单个嵌段域进行额外选择性蚀刻的情况下，用足够的高度对比来创建具有足够高度对比度的形貌纳米图案，从而用于纳米颗粒沉积。还优化了纳米材料的沉积方法，有效地在嵌段共聚物薄膜图案的凹槽中制备了密集排列的一维和二维纳米材料阵列。然后，我们证明通过电子束辐照可以反转表面重构的嵌段共聚物薄膜的高度对比度，从而将纳米材料阵列放置在纳米图案的台面相上。在此纳米材料放置控制策略的基础上，还在单个嵌段共聚物图案上实现了双纳米材料阵列。
