化学机械平面化：浆料化学、材料及机理 - Suppr

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超能文献

Chemical mechanical planarization: slurry chemistry, materials, and mechanisms.

作者信息

Krishnan Mahadevaiyer, Nalaskowski Jakub W, Cook Lee M

机构信息

IBM T.J. Watson Research Center, Yorktown Heights, New York 10598, USA.

出版信息

Chem Rev. 2010 Jan;110(1):178-204. doi: 10.1021/cr900170z.

DOI:10.1021/cr900170z

PMID:19928828

Abstract

摘要

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