Lin Cheng-Hsiang, Jiang Lan, Chai Yen-Hsin, Xiao Hai, Chen Shean-Jen, Tsai Hai-Lung
Department of Engineering Science, National Cheng Kung University, Tainan, Taiwan.
Opt Express. 2009 Nov 23;17(24):21581-9. doi: 10.1364/OE.17.021581.
This paper reports an efficient fabrication of nanostructures on silicon substrates for surface-enhanced Raman scattering (SERS). Silicon wafer substrates in the aqueous solution of silver nitrate were machined by the femtosecond laser direct writing to achieve simultaneously in one-step the generation of grating-like nanostructures on the surface of the substrate and the formation of silver nanoparticles on the surface of the nanostructures via the laser-induced photoreduction effect. Parametric studies were conducted for the different concentrations of aqueous silver nitrate solutions and scanning speeds. The enhancement factor of the SERS is found to be higher than 10(9). The patterning technique provides an opportunity to incorporate the SERS capability in a functional microchip.
本文报道了一种在硅基衬底上高效制备用于表面增强拉曼散射（SERS）的纳米结构的方法。将硅片衬底置于硝酸银水溶液中，通过飞秒激光直写进行加工，一步同时实现衬底表面类光栅纳米结构的生成以及通过激光诱导光还原效应在纳米结构表面形成银纳米颗粒。针对不同浓度的硝酸银水溶液和扫描速度进行了参数研究。发现SERS的增强因子高于10⁹。这种图案化技术为在功能性微芯片中融入SERS能力提供了契机。
