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聚合物铁电纳米结构的快速压印和优异的压电阻抗。

Rapid nanoimprinting and excellent piezoresponse of polymeric ferroelectric nanostructures.

机构信息

Department of Mechanical Engineering, University of Washington, Seattle, Washington 98195-2600, USA.

出版信息

ACS Nano. 2010 Jan 26;4(1):83-90. doi: 10.1021/nn901397r.

Abstract

Nanostructured ferroelectric patterns are promising for a wide range of applications, including sensing and actuation, data storage, photonics, spintronics, and energy conversion and storage. In this work, a rapid nanoimprinting technique is developed to pattern ferroelectric poly(vinylidene fluoride-trifluoroethylene) [P(VDF-TrFE)] copolymers in just 3 min, which exhibit excellent ferroelectricity and piezoresponse without any post-imprinting annealing. The effects of imprinting conditions have been thoroughly investigated, and the optimal imprinting parameters for excellent pattern transfer have been identified. The application of the imprinted polymeric patterns as a ferroelectric nonvolatile memory for data storage has also been demonstrated and discussed.

摘要

纳米结构铁电图案在传感和致动、数据存储、光子学、自旋电子学以及能量转换和存储等广泛领域具有广阔的应用前景。在这项工作中,开发了一种快速纳米压印技术,可在短短 3 分钟内对铁电聚(偏二氟乙烯-三氟乙烯)[P(VDF-TrFE)]共聚物进行图案化,无需后压印退火即可表现出优异的铁电性和压电阻效应。深入研究了压印条件的影响,并确定了获得优异图案转移的最佳压印参数。还展示和讨论了所印聚合物图案作为铁电非易失性存储器在数据存储中的应用。

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