用于一维和二维周期性纳米级特征图案化的大面积无掩膜表面等离子体干涉技术。

Large-area maskless surface plasmon interference for one- and two-dimensional periodic nanoscale feature patterning.

作者信息

Sreekanth K V, Murukeshan V M

机构信息

School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.

出版信息

J Opt Soc Am A Opt Image Sci Vis. 2010 Jan;27(1):95-9. doi: 10.1364/JOSAA.27.000095.

DOI:10.1364/JOSAA.27.000095

PMID:20035308

Abstract

A promising maskless surface-plasmon-interference nanoscale lithographic technique is proposed and demonstrated experimentally in this paper. One-dimensional (grating-type) and two-dimensional (pillar-type) nanocale features were patterned on the photoresist layer using a 364 nm illumination wavelength source with a single exposure, by employing a custom-made prism layer configuration. Large-area patterns of grating lines and pillars with feature size approximately 90 nm were realized experimentally using this configuration.

摘要

本文提出了一种有前景的无掩膜表面等离子体干涉纳米光刻技术，并进行了实验验证。通过采用定制的棱镜层配置，使用364 nm照明波长光源单次曝光，在光刻胶层上制备了一维（光栅型）和二维（柱型）纳米尺度特征图案。利用这种配置，实验实现了特征尺寸约为90 nm的大面积光栅线和柱图案。