用于纳米级特征图案化的干涉光刻：激光干涉、倏逝波干涉和表面等离子体干涉之间的比较分析。

Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference.

作者信息

Sreekanth Kandammathe Valiyaveedu, Chua Jeun Kee, Murukeshan Vadakke Matham

机构信息

School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798.

出版信息

Appl Opt. 2010 Dec 10;49(35):6710-7. doi: 10.1364/AO.49.006710.

DOI:10.1364/AO.49.006710

PMID:21151227

Abstract

In this paper, we experimentally demonstrate and compare single-exposure multiple-beam interference lithography based on conventional laser interference, evanescent wave interference, and surface plasmon interference. The proposed two-beam and four-beam interference approaches are carried out theoretically and verified experimentally, employing the proposed configurations so as to realize the patterning of one- and two-dimensional periodic features on photoresists. A custom-fabricated grating is employed in the configuration in order to achieve two- and four-beam interference.

摘要

在本文中，我们通过实验展示并比较了基于传统激光干涉、倏逝波干涉和表面等离子体干涉的单次曝光多光束干涉光刻技术。从理论上开展了所提出的双光束和四光束干涉方法，并通过实验进行了验证，采用所提出的配置以实现光刻胶上一维和二维周期性特征的图案化。在该配置中采用了定制制造的光栅，以实现双光束和四光束干涉。