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利用 TEM 对多铁性 ReMnO(3)薄膜和多层膜的结构和缺陷特征进行研究。

Structure and defect characterization of multiferroic ReMnO(3) films and multilayers by TEM.

机构信息

Electron Microscopy for Materials Research (EMAT), University of Antwerp, Groenenborgerlaan 171, B2020 Antwerpen, Belgium.

出版信息

Nanotechnology. 2010 Feb 19;21(7):75705. doi: 10.1088/0957-4484/21/7/075705. Epub 2010 Jan 18.

Abstract

Epitaxial rare earth manganite thin films (ReMnO(3); Re = Tb, Ho, Er, and Y) and multilayers were grown by liquid injection metal organic chemical vapor deposition (MOCVD) on YSZ(111) and the same systems were grown c-oriented on Pt(111) buffered Si substrates. They have been structurally investigated by electron diffraction (ED) and high resolution transmission electron microscopy (HRTEM). Nanodomains of secondary orientation are observed in the hexagonal YMnO(3) films. They are related to a YSZ(111) and Pt(111) misorientation. The epitaxial film thickness has an influence on the defect formation. TbO(2) and Er(2)O(3) inclusions are observed in the TbMnO(3) and ErMnO(3) films respectively. The structure and orientation of these inclusions are correlated to the resembling symmetry and structure of film and substrate. The type of defect formed in the YMnO(3)/HoMnO(3) and YMnO(3)/ErMnO(3) multilayers is also influenced by the type of substrate they are grown on. In our work, atomic growth models for the interface between the film/substrate are proposed and verified by comparison with observed and computer simulated images.

摘要

外延稀土锰氧化物薄膜(ReMnO3;Re = Tb、Ho、Er 和 Y)和多层膜通过液注射金属有机化学气相沉积(MOCVD)在 YSZ(111)上生长,相同的系统在 Pt(111)缓冲 Si 衬底上 c 取向生长。通过电子衍射(ED)和高分辨率透射电子显微镜(HRTEM)对它们进行了结构研究。在六方 YMnO3 薄膜中观察到了次级取向的纳米域。它们与 YSZ(111)和 Pt(111)的取向失配有关。外延膜厚度对缺陷形成有影响。在 TbMnO3 和 ErMnO3 薄膜中分别观察到了 TbO2 和 Er2O3 夹杂物。这些夹杂物的结构和取向与薄膜和衬底的相似对称性和结构相关。在 YMnO3/HoMnO3 和 YMnO3/ErMnO3 多层膜中形成的缺陷类型也受到它们生长的衬底类型的影响。在我们的工作中,提出了薄膜/衬底界面的原子生长模型,并通过与观察到的和计算机模拟的图像进行比较来验证。

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