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沉积在基于CeO₂/YSZ的缓冲硅衬底上的La(0.7)Sr(0.3)MnO(3)薄膜的高居里温度

High Curie temperature for La(0.7)Sr(0.3)MnO(3) thin films deposited on CeO(2) /YSZ-based buffered silicon substrates.

作者信息

Perna P, Méchin L, Chauvat M P, Ruterana P, Simon Ch, Scotti di Uccio U

机构信息

GREYC (UMR 6072)-CNRS-ENSICAEN, Universite Caen Basse-Normandie, 6 Boulevard Maréchal Juin, 14050 CAEN cedex, France. CNR-INFM CRS Coherentia and Dipartimento Scienze Fisiche, Universita di Napoli Federico II, Complesso Universitario di Monte S Angelo, via Cinthia 80126 NAPOLI, Italy.

出版信息

J Phys Condens Matter. 2009 Jul 29;21(30):306005. doi: 10.1088/0953-8984/21/30/306005. Epub 2009 Jul 6.

DOI:10.1088/0953-8984/21/30/306005
PMID:21828561
Abstract

Two kinds of epitaxial structures were grown by standard pulsed laser deposition on (001) Si, namely La(0.7)Sr(0.3)MnO(3)/Bi(4)Ti(3)O(12)/CeO(2) /YSZ/Si (BTO-based), and La(0.7)Sr(0.3)MnO(3)/SrTiO(3)/CeO(2) /YSZ/Si (STO-based) multilayers. The samples were investigated by means of x-ray diffraction, transmission electron microscopy, magnetic and transport measurements. The Curie temperature T(C) of the BTO-based samples was found to be higher (360 K) than for the typical reference epitaxial LSMO film grown on (001) SrTiO(3) single crystal (345 K), due to high compressive in-plane strain. The STO-based samples show high structural quality, low roughness and high T(C) (350 K), making them interesting candidates for use in innovative LSMO-based bolometers or spintronic devices operating at room temperature.

摘要

通过标准脉冲激光沉积在(001)Si上生长了两种外延结构,即La(0.7)Sr(0.3)MnO(3)/Bi(4)Ti(3)O(12)/CeO(2)/YSZ/Si(基于BTO)和La(0.7)Sr(0.3)MnO(3)/SrTiO(3)/CeO(2)/YSZ/Si(基于STO)多层结构。通过X射线衍射、透射电子显微镜、磁性和输运测量对样品进行了研究。发现基于BTO的样品的居里温度T(C)(360 K)高于在(001)SrTiO(3)单晶上生长的典型参考外延LSMO薄膜的居里温度(345 K),这是由于高的面内压缩应变。基于STO的样品显示出高的结构质量、低粗糙度和高T(C)(350 K),使其成为用于在室温下工作的创新型基于LSMO的测辐射热计或自旋电子器件的有趣候选材料。

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