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硅锗/硅弛豫样品上的霍尔兹线分裂:运动学方程的解析解。

HOLZ lines splitting on SiGe/Si relaxed samples: analytical solutions for the kinematical equation.

机构信息

CNRS, IM2NP (UMR 6242), Faculté des Sciences et Techniques, Campus de Saint-Jérôme, Avenue Escadrille Normandie Niemen-Case 262, F-13397 Marseille Cedex, France.

出版信息

Ultramicroscopy. 2010 Mar;110(4):285-96. doi: 10.1016/j.ultramic.2009.12.005. Epub 2009 Dec 21.

Abstract

Sample thinning for TEM observation introduces large changes with respect to the initial strain state of the bulk sample and particularly relaxation via the free surfaces which leads to HOLZ lines splitting in the CBED pattern. This phenomenon has been simulated owing to extensive calculations either in the kinematical or the dynamical framework of electron diffraction mainly using displacement fields resulting from finite element modelling of the sample relaxation. HOLZ line splitting is well reproduced and numerical fits can be used to compare experimental and calculated curves. This paper proposes new analytical solutions for the kinematical equation of electron diffraction. Simple mathematical functions are used to approximate the deformation profiles. We showed that, under certain conditions, the rocking curve profile can be analytically calculated, thus providing some clue to separate different contributions to the rocking curves against deformation profile. These simplified analytical expressions are used to extract the maximum amplitude displacement within the sample with about 10% accuracy. This accuracy can even be improved to 1% with a short adjustment routine. The influence of the shape of the displacement profile on the rocking curves is demonstrated.

摘要

用于 TEM 观察的样品减薄会导致与体样品初始应变状态有关的大变化,特别是通过自由表面的松弛,这会导致 CBED 图案中的 HOLZ 线分裂。这种现象已经通过在电子衍射的运动学或动力学框架内进行广泛的计算来模拟,主要使用样品松弛的有限元建模产生的位移场。HOLZ 线分裂得到了很好的再现,并且可以进行数值拟合来比较实验和计算曲线。本文提出了电子衍射运动学方程的新解析解。简单的数学函数用于逼近变形轮廓。我们表明,在某些条件下,可以解析地计算摇摆曲线轮廓,从而为分离摇摆曲线对变形轮廓的不同贡献提供了一些线索。这些简化的解析表达式用于以约 10%的精度提取样品内的最大幅度位移。通过一个简短的调整例程,甚至可以将精度提高到 1%。还演示了位移轮廓的形状对摇摆曲线的影响。

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