Zech R G, Dwyer J C, Fichter H, Lewis M
Appl Opt. 1973 Dec 1;12(12):2822-7. doi: 10.1364/AO.12.002822.
The experimental evaluation of a new heat-processed photoresist is reported with reference to holographic data storage applications. Two attractive features of the photoresist are (1) holographic reconstruction parameters comparable to the best photographic emulsions and (2) orthochromatic exposure sensitivity optimized for the 488-nm line of an argon laser. The preparation, use, and general properties of the photoresist are discussed, and relevant experimental data for important holographic parameters such as diffraction efficiency and storage density are presented.
本文报道了一种新型热加工光刻胶针对全息数据存储应用的实验评估。该光刻胶具有两个吸引人的特性：（1）全息重建参数与最佳照相乳剂相当；（2）对氩离子激光器的488纳米谱线优化了正色曝光灵敏度。文中讨论了光刻胶的制备、使用和一般特性，并给出了诸如衍射效率和存储密度等重要全息参数的相关实验数据。
