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Extending the limit of atomic level grain boundary structure imaging using high-resolution electron microscopy.

作者信息

Krakow W

机构信息

IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598.

出版信息

J Electron Microsc Tech. 1991 Feb;17(2):212-20. doi: 10.1002/jemt.1060170208.

Abstract

It has been possible to image sigma = 21/[111]21.8 degrees tilt boundaries in thin Au films and to deduce their atomic arrangements. These results represent an electron microscopic resolution level of 1.43 A, attainable with a small amount of image processing, which produces interpretable structure images. This substantial improvement over other recent grain boundary studies, which required about 1.9-2.0 A resolution, clearly demonstrates that many more tilt grain boundary orientations are now accessible instead of a limited subset.

摘要

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