SonicMEMS Laboratory, School of Electrical and Computer Engineering, Cornell University, Ithaca, NY 14853, USA.
Nanotechnology. 2010 Mar 5;21(9):095306. doi: 10.1088/0957-4484/21/9/095306. Epub 2010 Feb 8.
In this work we present precision scanning probe etching of highly ordered pyrolytic graphite. We corroborate that the lithography is due to an electrochemical, polarity-dependent, meniscus-mediated etching of the carbon surface. By changing the etching temperature, we are able to reduce the feature size by 24%. External feedback control and probe tip cleaning enables desired cut patterns with high precision. Using a feedback-controlled atomic force microscope, we demonstrate an array of 105 trenches using 370 etching operations, with 136 +/- 6 and 183 +/- 5 nm precision over an area of 2.5 microm x 2.5 microm. This results in a precision of 4.4% and 2.7%, respectively.
在这项工作中，我们展示了高度有序的热解石墨的精密扫描探针刻蚀。我们证实，这种光刻是由于电化学、极性依赖、弯月面介导的碳表面刻蚀。通过改变刻蚀温度，我们能够将特征尺寸缩小 24%。外部反馈控制和探针尖端清洁使得可以使用高精度进行所需的切割图案。使用反馈控制原子力显微镜，我们在 2.5 微米 x 2.5 微米的面积上演示了 105 个沟槽的阵列，具有 136 +/- 6 和 183 +/- 5nm 的精度，共进行了 370 次刻蚀操作。这分别导致了 4.4%和 2.7%的精度。
