Jesacher Alexander, Marshall Graham D, Wilson Tony, Booth Martin J
Department of Engineering Science, University of Oxford, Oxford, United Kingdom.
Opt Express. 2010 Jan 18;18(2):656-61. doi: 10.1364/OE.18.000656.
Aberrations affect the focal spot quality in direct laser write applications when focusing through a refractive index mismatch. Closed loop adaptive optics can correct these aberrations if a suitable feedback signal can be found. Focusing an ultrafast laser beam into transparent dielectric material can lead to plasma formation in the focal region. We report using the supercontinuum emitted by such a plasma to measure the optical aberrations, the subsequent aberration correction using a spatial light modulator and the fabrication of nanostructures using the corrected optical system.
当通过折射率失配进行聚焦时，像差会影响直接激光写入应用中的焦斑质量。如果能找到合适的反馈信号，闭环自适应光学系统可以校正这些像差。将超快激光束聚焦到透明介电材料中会导致在焦点区域形成等离子体。我们报告了利用这种等离子体发射的超连续谱来测量光学像差、随后使用空间光调制器进行像差校正以及使用校正后的光学系统制造纳米结构。
