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测量薄膜涂层中的红外吸收。

Measuring the infrared absorption in thin film coatings.

作者信息

Harrington J A, Braunstein M, Rudisill J E

出版信息

Appl Opt. 1977 Nov 1;16(11):2843-6. doi: 10.1364/AO.16.002843.

DOI:10.1364/AO.16.002843
PMID:20174253
Abstract

Traditionally, the optical absorption in thin dielectric films has been obtained by comparing the absorption in coated and uncoated substrates. A new technique has been developed in which the absorption of the film is obtained directly without resorting to comparison or difference methods. This method relies on the separation of surface and bulk heat that results from laser calorimetric measurements on long, bar-shaped samples. Single layer films of As(2)S(3), CaF(2), ThF(4), and PbF(2) were deposited on a KCl bar, and the absorption coefficient of each film was extracted from the slopes of the temperature-time curves.

摘要

传统上,薄介电薄膜中的光吸收是通过比较涂覆和未涂覆衬底的吸收来获得的。已经开发出一种新技术,通过该技术可以直接获得薄膜的吸收,而无需借助比较或差值方法。该方法依赖于对长条形样品进行激光量热测量时产生的表面热和体热的分离。将As(2)S(3)、CaF(2)、ThF(4)和PbF(2)的单层薄膜沉积在KCl棒上,并从温度-时间曲线的斜率中提取每个薄膜的吸收系数。

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