Harrington J A, Rudisill J E, Braunstein M
Appl Opt. 1978 Sep 1;17(17):2798-801. doi: 10.1364/AO.17.002798.
A systematic study was made of thin-film absorption at 2.8microm and 3.8 microm for a wide variety of transparent coating materials. The extinction and absorption coefficients were measured using HF/DF chemical laser calorimetry in single-layer films of PbF(2), LiF, YbF(3), NaF, ThF(4), As(2),S(3), As(2),Se(3), Si, MgO, ZnSe, and Al(2),O(3), on CaF(2), substrates. The lowest absorbing film materials were the As glasses, ZnSe, and some fluorides. In these cases, high-purity starting material led to the lowest loss films.
对多种透明涂层材料在2.8微米和3.8微米处的薄膜吸收进行了系统研究。使用HF/DF化学激光量热法在CaF₂衬底上的PbF₂、LiF、YbF₃、NaF、ThF₄、As₂S₃、As₂Se₃、Si、MgO、ZnSe和Al₂O₃单层薄膜中测量了消光系数和吸收系数。吸收最低的薄膜材料是砷玻璃、ZnSe和一些氟化物。在这些情况下，高纯度原料导致损耗最低的薄膜。
