采用胶体光刻技术实现近红外光高透过率和超疏水性的仿生二氧化硅表面。

Bioinspired silica surfaces with near-infrared improved transmittance and superhydrophobicity by colloidal lithography.

机构信息

State Key Laboratory of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, PR China.

出版信息

Langmuir. 2010 Jun 15;26(12):9842-7. doi: 10.1021/la100183y.

DOI:10.1021/la100183y

PMID:20201567

Abstract

In this paper, we report a kind of bioinspired high performance near-infrared improved transmittance silica surfaces with superhydrophobic properties by colloidal lithography, with transmittance about 99% from 1300 to 2000 nm. Meanwhile, the optical properties of such surfaces can be controlled by the antireflective structure morphologies resulting from the different reactive ion etching conditions. Using proper microspheres as mask, the high-performance near-infrared telecommunication optics can be achieved. Besides, the antireflective surfaces possess superhydrophobic properties after modified by fluorosilane. Such antireflective surfaces are promising for fabrication of highly light transmissive, antireflective, and superhydrophobic near-infrared optical materials to be used in many important fields.

摘要

本文通过胶体光刻技术制备了一种具有超疏水性能的仿生高性能近红外改善透光率的二氧化硅表面，其在 1300 至 2000nm 范围内的透光率约为 99%。同时，通过不同的反应离子刻蚀条件得到的抗反射结构形态，可以控制这种表面的光学性能。采用合适的微球作为掩模，可以实现高性能的近红外远程通信光学元件。此外，经过氟硅烷改性后，这种具有抗反射功能的表面具有超疏水性能。这种抗反射表面有望用于制造高透光率、抗反射和超疏水的近红外光学材料，应用于许多重要领域。