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纳米工程粗糙 Ge 和 GaAs 纳米线中的热导率降低。

Reduced thermal conductivity in nanoengineered rough Ge and GaAs nanowires.

机构信息

Department of Electrical and Computer Engineering, University of Illinois, Urbana-Champaign, Urbana, Illinois 61801, USA.

出版信息

Nano Lett. 2010 Apr 14;10(4):1120-4. doi: 10.1021/nl902720v.

Abstract

We model and compare the thermal conductivity of rough semiconductor nanowires (NWs) of Si, Ge, and GaAs for thermoelectric devices. On the basis of full phonon dispersion relations, the effect of NW surface roughness on thermal conductivity is derived from perturbation theory and appears as an efficient way to scatter phonons in Si, Ge, and GaAs NWs with diameter D < 200 nm. For small diameters and large root-mean-square roughness Delta, thermal conductivity is limited by surface asperities and varies quadratically as (D/Delta)(2). At room temperature, our model previously agreed with experimental observations of thermal conductivity down to 2 W m(-1) K(-1) in rough 56 nm Si NWs with Delta = 3 nm. In comparison to Si, we predict here remarkably low thermal conductivity in Ge and GaAs NWs of 0.1 and 0.4 W m(-1) K(-1), respectively, at similar roughness and diameter.

摘要

我们对用于热电设备的粗糙半导体纳米线(NWs)的热导率进行建模和比较,这些 NWs 的材料分别为 Si、Ge 和 GaAs。基于完整的声子色散关系,通过微扰理论得出 NW 表面粗糙度对热导率的影响,这是在直径 D < 200nm 的 Si、Ge 和 GaAs NW 中有效散射声子的方法。对于较小的直径和较大的均方根粗糙度 Delta,热导率受到表面起伏的限制,并与(Delta)(2)呈二次方关系。在室温下,我们的模型之前与实验观察到的热导率一致,在粗糙度为 3nm 的 56nm SiNWs 中,热导率低至 2Wm(-1)K(-1)。与 Si 相比,我们在这里预测在类似的粗糙度和直径下,Ge 和 GaAs NW 的热导率分别显著降低到 0.1 和 0.4Wm(-1)K(-1)。

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