Bioud Youcef A, Boucherif Abderraouf, Belarouci Ali, Paradis Etienne, Drouin Dominique, Arès Richard
Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463, Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, J1K OA5, Québec, Canada.
Nanoscale Res Lett. 2016 Dec;11(1):446. doi: 10.1186/s11671-016-1642-z. Epub 2016 Oct 4.
We have performed a detailed characterization study of electrochemically etched p-type GaAs in a hydrofluoric acid-based electrolyte. The samples were investigated and characterized through cathodoluminescence (CL), X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDX), and X-ray photoelectron spectroscopy (XPS). It was found that after electrochemical etching, the porous layer showed a major decrease in the CL intensity and a change in chemical composition and in the crystalline phase. Contrary to previous reports on p-GaAs porosification, which stated that the formed layer is composed of porous GaAs, we report evidence that the porous layer is in fact mainly constituted of porous AsO. Finally, a qualitative model is proposed to explain the porous AsO layer formation on p-GaAs substrate.
我们对基于氢氟酸的电解液中电化学蚀刻的p型砷化镓进行了详细的特性研究。通过阴极发光(CL)、X射线衍射(XRD)、能量色散X射线光谱(EDX)和X射线光电子能谱(XPS)对样品进行了研究和表征。结果发现,电化学蚀刻后,多孔层的阴极发光强度大幅下降,化学成分和晶相发生了变化。与之前关于p型砷化镓多孔化的报道相反,之前的报道称形成的层由多孔砷化镓组成,而我们报告的证据表明,多孔层实际上主要由多孔AsO构成。最后,提出了一个定性模型来解释p型砷化镓衬底上多孔AsO层的形成。