Kirchhoff Institute for Physics, Im Neuenheimer Feld 227, 69120 Heidelberg, Germany.
Appl Spectrosc. 2010 Mar;64(3):298-303. doi: 10.1366/000370210790918346.
Physical evaporation of SiO and SiO(2) under ultra-high vacuum conditions was monitored in situ with infrared spectroscopy at frequencies between 450 cm(-1) and 5000 cm(-1). The measured vibrational spectra of the condensed films are identical in both cases, for SiO and SiO(2) evaporation, and can be described with four Brendel oscillators located at 380 cm(-1), 713 cm(-1), 982 cm(-1), and 1101 cm(-1), corresponding to typical vibration modes in SiO.
采用红外光谱法在超高真空条件下对 SiO 和 SiO(2)的物理蒸发进行了实时监测,测量频率范围为 450 cm(-1) 至 5000 cm(-1)。在 SiO 和 SiO(2)蒸发的情况下,所测量的凝聚膜的振动光谱在两种情况下都是相同的,并且可以用四个 Brendel 振荡器来描述,它们位于 380 cm(-1)、713 cm(-1)、982 cm(-1)和 1101 cm(-1),对应于 SiO 中的典型振动模式。