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InGaP 纳米线形态和结构对分子束外延生长条件的依赖性。

Dependence of InGaP nanowire morphology and structure on molecular beam epitaxy growth conditions.

机构信息

Department of Electrical and Computer Engineering, McMaster University, Hamilton, ON, L8S 4K1, Canada.

出版信息

Nanotechnology. 2010 Apr 23;21(16):165601. doi: 10.1088/0957-4484/21/16/165601. Epub 2010 Mar 26.

Abstract

InGaP nanowires (NWs) were grown by the Au-assisted method in a gas source molecular beam epitaxy system. The dependence of InGaP composition, morphology and stacking fault density was studied with respect to group III and V impingement rate and size of the Au particle. Compositional analysis showed that the NWs had an In-rich core and a Ga-rich shell structure. The In incorporation within the NW became limited as the Au seed particle size diminished or the group III and V flux decreased. The NWs had wurtzite (WZ) crystal structure with zinc blende (ZB) segments (stacking faults). The density of the stacking faults decreased as the group III flux decreased and the group V flux increased.

摘要

采用 Au 辅助方法在气源分子束外延系统中生长 InGaP 纳米线 (NWs)。研究了 III 族和 V 族撞击速率以及 Au 颗粒大小对 InGaP 组成、形态和位错密度的影响。成分分析表明,NWs 具有富 In 的核和富 Ga 的壳结构。随着 Au 种子颗粒尺寸减小或 III 族和 V 族通量减小,NW 中 In 的掺入量受到限制。NWs 具有纤锌矿 (WZ) 晶体结构和闪锌矿 (ZB) 段 (位错)。随着 III 族通量的减少和 V 族通量的增加,位错密度降低。

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