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碳纳米管的化学气相沉积:生长机制与大规模生产综述

Chemical vapor deposition of carbon nanotubes: a review on growth mechanism and mass production.

作者信息

Kumar Mukul, Ando Yoshinori

机构信息

Department of Materials Science and Engineering, Meijo University, Nagoya 468-8502, Japan.

出版信息

J Nanosci Nanotechnol. 2010 Jun;10(6):3739-58. doi: 10.1166/jnn.2010.2939.

Abstract

This review article deals with the growth mechanism and mass production of carbon nanotubes (CNTs) by chemical vapor deposition (CVD). Different aspects of CNT synthesis and growth mechanism are reviewed in the light of latest progresses and understandings in the field. Materials aspects such as the roles of hydrocarbon, catalyst and catalyst support are discussed. Many new catalysts and new carbon sources are described. Growth-control aspects such as the effects of temperature, vapor pressure and catalyst concentration on CNT diameter distribution and single- or multi-wall formation are explained. Latest reports of metal-catalyst-free CNT growth are considered. The mass-production aspect is discussed from the perspective of a sustainable CNT technology. Existing problems and challenges of the process are addressed with future directions.

摘要

这篇综述文章探讨了通过化学气相沉积(CVD)法制备碳纳米管(CNT)的生长机制及大规模生产。鉴于该领域的最新进展和认识,对碳纳米管合成及生长机制的不同方面进行了综述。讨论了材料方面,如碳氢化合物、催化剂及催化剂载体的作用。介绍了许多新型催化剂和新型碳源。解释了生长控制方面,如温度、蒸气压和催化剂浓度对碳纳米管直径分布及单壁或多壁形成的影响。考虑了无金属催化剂生长碳纳米管的最新报道。从可持续碳纳米管技术的角度讨论了大规模生产方面。阐述了该工艺目前存在的问题和挑战以及未来的发展方向。

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