IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598, USA.
Phys Rev Lett. 2009 Dec 18;103(25):256101. doi: 10.1103/PhysRevLett.103.256101. Epub 2009 Dec 14.
Using in situ electron microscopy, we have measured the structure of SiC(0001)-4H during annealing in vacuum. Above 1000 degrees C, an additional SiC bilayer forms on the surface that changes the polytype from hexagonal (4H) to cubic (3C). The interaction with surface steps prevents the cubic layer from growing thicker: the new phase does not wet the steps of the underlying 4H substrate. Instead, the cubic layer expands laterally, accelerating step bunching in the surrounding hexagonal regions. During SiC homoepitaxy, this lack of step edge wetting leads to the growth of 3C twins separated by deep grooves.
使用原位电子显微镜,我们测量了 SiC(0001)-4H 在真空中退火时的结构。在 1000 摄氏度以上,表面会形成额外的 SiC 双层,从而将多型结构从六方(4H)转变为立方(3C)。与表面台阶的相互作用阻止了立方层的进一步增厚:新相不会润湿下方 4H 衬底的台阶。相反,立方层会横向扩展,加速周围六方区域中台阶的团聚。在 SiC 同质外延生长过程中,这种缺乏台阶边缘润湿的情况会导致由深槽隔开的 3C 孪晶的生长。