Windt D L, Cash W C, Scott M, Arendt P, Newnam B, Fisher R F, Swartzlander A B
Appl Opt. 1988 Jan 15;27(2):246-78. doi: 10.1364/AO.27.000246.
Reflectance vs incidence angle measurements have been performed from 24 A to 1216 A on electron-beam evaporated samples of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Os, Ir, Pt, and Au, and using a nonlinear least-squares curve-fitting technique, the optical constants have been determined. Independently measured values of the incident beam polarization, film thicknesses, and film surface roughnesses are incorporated into the derivation of the optical constants. Additionally, Auger electron spectroscopy depth profiling measurements have been performed on each sample to characterize sample composition including oxidation and contamination.
在24埃至1216埃范围内对钛、锆、铌、钼、钌、铑、钯、银、铪、钽、钨、铼、锇、铱、铂和金的电子束蒸发样品进行了反射率与入射角测量，并使用非线性最小二乘曲线拟合技术确定了光学常数。入射光束偏振、薄膜厚度和薄膜表面粗糙度的独立测量值被纳入光学常数的推导过程中。此外，还对每个样品进行了俄歇电子能谱深度剖析测量，以表征包括氧化和污染在内的样品成分。
