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碳、金刚石、铝、硅和化学气相沉积碳化硅薄膜在24埃至1216埃范围内的光学常数。

Optical constants for thin films of C, diamond, Al, Si, and CVD SIC from 24 A to 1216 A.

作者信息

Windt D L, Cash W C, Scott M, Arendt P, Newnam B, Fisher R F, Swartzlander A B, Takacs P Z, Pinneo J M

出版信息

Appl Opt. 1988 Jan 15;27(2):279-95. doi: 10.1364/AO.27.000279.

Abstract

A method for deriving optical constants from reflectance vs angle of incidence measurements using a nonlinear least-squares curve-fitting technique based on the chi(2) test of fit is presented and used to derive optical constants for several thin-film materials. The curve-fitting technique incorporates independently measured values for the film surface roughness, film thickness, and incident beam polarization. The technique also provides a direct method for estimating probable errors in the derived optical constants. Data are presented from 24 A to 1216 A for thin-film samples of C, synthetic diamond, Al, Si, and CVD SiC. Auger electron spectroscopy depth profiling measurements were performed on some of the samples to characterize sample composition including oxidation and contamination.

摘要

提出了一种基于拟合优度的卡方检验,使用非线性最小二乘曲线拟合技术从反射率与入射角测量值中推导光学常数的方法,并将其用于推导几种薄膜材料的光学常数。该曲线拟合技术纳入了薄膜表面粗糙度、薄膜厚度和入射光束偏振的独立测量值。该技术还提供了一种直接方法来估计推导光学常数中的可能误差。给出了碳、合成金刚石、铝、硅和化学气相沉积碳化硅薄膜样品从24埃到1216埃的数据。对一些样品进行了俄歇电子能谱深度剖析测量,以表征包括氧化和污染在内的样品成分。

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