Kortright J B, Windt D L
Appl Opt. 1988 Jul 15;27(14):2841-6. doi: 10.1364/AO.27.002841.
Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.
通过溅射技术形成的非晶碳化硅薄膜在极紫外光谱区域具有高反射率。X射线散射证实这些薄膜中的原子排列是无定形的,而俄歇电子能谱和卢瑟福背散射光谱表明,尽管薄膜略富碳且杂质水平低,但它们的成分接近化学计量比的SiC。利用从24至1216埃的反射率与入射角测量结果来推导这种材料的光学常数,本文给出了这些光学常数。此外,还给出了涂覆有溅射非晶碳化硅的衍射光栅的测量极紫外效率,证明了使用这些薄膜作为极紫外光学器件涂层的可行性。