Larruquert Juan I, Pérez-Marín Antonio P, García-Cortés Sergio, Rodríguez-de Marcos Luis, Aznárez José A, Méndez José A
GOLD-Instituto de Óptica-Consejo Superior de Investigaciones Científicas, Madrid, Spain.
J Opt Soc Am A Opt Image Sci Vis. 2011 Nov 1;28(11):2340-5. doi: 10.1364/JOSAA.28.002340.
The optical constants of ion-beam-sputtered SiC films have been measured by ellipsometry in the 190 to 950 nm range. The set of data has been extended both toward shorter and longer wavelengths with data in the literature, along with inter- and extrapolations, in order to obtain a self-consistent set of data by means of Kramers-Krönig analysis. All data correspond to films that were deposited by sputtering on nonheated substrates, and hence they are expected to be amorphous. A bandgap of 1.9 eV for the films was fitted from the obtained optical constants. A good global accuracy of the data was estimated through the use of various sum rules. The consistent dataset includes the visible to the extreme ultraviolet (EUV); this large spectrum of characterization will enable the design of multilayer coatings that combine a high reflectance in parts of the EUV with desired performance at a secondary range, such as the visible. To our knowledge, this paper provides the first compilation of the optical constants of amorphous SiC films.
通过椭偏仪在190至950纳米范围内测量了离子束溅射碳化硅薄膜的光学常数。利用文献中的数据以及内插和外推法，将数据集向更短和更长波长扩展，以便通过克莱默斯-克勒尼希分析获得一组自洽的数据。所有数据均对应于通过溅射沉积在未加热衬底上的薄膜，因此预计它们是非晶态的。根据获得的光学常数拟合出薄膜的带隙为1.9电子伏特。通过使用各种求和规则估计了数据的良好整体精度。一致的数据集涵盖了可见光到极紫外（EUV）范围；如此广泛的表征光谱将有助于设计多层涂层，使其在EUV部分具有高反射率，并在可见光等次要范围内具有所需性能。据我们所知，本文首次汇编了非晶碳化硅薄膜的光学常数。
