Chemical Engineering Department, New Mexico State University, Las Cruces, NM 88003, USA.
J Colloid Interface Sci. 2010 Aug 15;348(2):615-20. doi: 10.1016/j.jcis.2010.04.078. Epub 2010 May 10.
Ammonia adsorption equilibrium and kinetics on MOF-5 and MOF-177 were measured volumetrically at 298 K and ammonia pressures up to 800 torr. This study allowed us to determine the ammonia adsorption properties and stability of both MOFs after exposure to ammonia. MOF-177 adsorbed more ammonia than MOF-5 at ammonia pressures below 150 torr and the ammonia adsorption capacity on both MOFs at 800 torr was about the same (12.2 mmol/g). It can be inferred from the adsorption results that physical adsorption of ammonia on both MOFs dominated at ammonia pressures below 150 torr after which chemical reactions between ammonia and MOF frameworks take place. After exposure to ammonia both MOFs lost majority of their pore textures as evidenced by a drastic decrease of specific surface area and pore volume. The X-ray diffraction study suggested a complete loss of crystallinity of both MOFs, and the FT-IR and Raman spectral analyses showed the generation of free organic ligands within both MOF-5 and MOF-177 after they were exposed to ammonia. Ammonia molecules are proposed to destroy the MOF frameworks by forming hydrogen bonds with Zn(4)O clusters of MOFs.
采用体积法在 298 K 下测定了 MOF-5 和 MOF-177 对氨的吸附平衡和动力学,研究了氨暴露后两种 MOF 的氨吸附性能和稳定性。在氨压低于 150 托时,MOF-177 比 MOF-5 吸附更多的氨,而在 800 托时,两种 MOF 的氨吸附量大致相同(12.2 mmol/g)。从吸附结果推断,在氨压低于 150 托时,氨在两种 MOF 上主要通过物理吸附,之后氨与 MOF 骨架之间发生化学反应。暴露于氨后,两种 MOF 均失去了大部分孔结构,比表面积和孔体积急剧下降。X 射线衍射研究表明,两种 MOF 的结晶度完全丧失,FT-IR 和拉曼光谱分析表明,暴露于氨后,MOF-5 和 MOF-177 内均生成游离有机配体。氨分子通过与 MOF 中 Zn(4)O 簇形成氢键来破坏 MOF 骨架。