激光产生等离子体的软X射线辐射：辐射发射特性及其在X射线光刻中的应用。

Soft x-ray radiation from laser-produced plasmas: characterization of radiation emission and its use in x-ray lithography.

作者信息

Kühne M, Petzold H C

出版信息

Appl Opt. 1988 Sep 15;27(18):3926-32. doi: 10.1364/AO.27.003926.

DOI:10.1364/AO.27.003926

PMID:20539491

Abstract

Laser pulses of 15 ns and </=3 J at 1064nm and </=1.2 J at 532 nm were focused onto steel targets to produce plasmas emitting intense soft x-ray radiation pulses. The plasma generation is described, and the x-ray emission is spectrally and spatially characterized. Using this plasma as an x-ray source, FBM120 resist was exposed through a gold patterned 2-microm silicon mask. Exposing the same resist to a primary standard source (electron storage ring BESSY) the plasma x-ray emission was evaluated resulting in conversion efficiencies (laser into x-ray radiation) of up to 3.4% for 1064 nm and up to 5.0% for 532-nm laser radiation pulses.

摘要

1064纳米波长下15纳秒且能量≤3焦耳、532纳米波长下能量≤1.2焦耳的激光脉冲被聚焦到钢靶上，以产生发射强烈软X射线辐射脉冲的等离子体。描述了等离子体的产生过程，并对X射线发射进行了光谱和空间特性分析。使用该等离子体作为X射线源，通过一个带有金图案的2微米硅掩膜对FBM120抗蚀剂进行曝光。将相同的抗蚀剂暴露于一个初级标准源（电子储存环BESSY）下，对等离子体X射线发射进行评估，结果表明，对于1064纳米的激光辐射脉冲，激光到X射线辐射的转换效率高达3.4%；对于532纳米的激光辐射脉冲，转换效率高达5.0%。