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利用反射率测量确定吸收薄膜的(n,k)。

Determination of (n,k) for absorbing thin films using reflectance measurements.

作者信息

Siqueiros J M, Regalado L E, Machorro R

出版信息

Appl Opt. 1988 Oct 15;27(20):4260-4. doi: 10.1364/AO.27.004260.

Abstract

We propose a method for determination of the complex refractive index of absorbing materials either in bulk or film geometry by measuring its reflectivity when coated with a well-characterized transparent dielectric at two specific optical thicknesses: n(1)d(1) = lambda(0)/4 and n(1)d(1) = lambda(0)/2. The complex refractive index of the sample ñ = (n,k) is calculated for the monitoring wavelength lambda(0). The selected optical thicknesses of the coating allow the calculation of its geometrical thickness, therefore the variation of ñ with wavelength in the region where the reflectivity is measured can be determined.

摘要

我们提出了一种方法,用于通过测量吸收材料在两种特定光学厚度下涂覆有特性良好的透明电介质时的反射率,来确定块状或薄膜状吸收材料的复折射率:n(1)d(1) = λ(0)/4 和 n(1)d(1) = λ(0)/2。针对监测波长λ(0)计算样品的复折射率ñ = (n,k)。涂层选定的光学厚度可用于计算其几何厚度,因此可以确定在测量反射率的区域中ñ随波长的变化。

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