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抗反射表面结构:在有损衬底上的高空间频率表面浮雕光栅上的介电层。

Antireflection surface structure: dielectric layer(s) over a high spatial-frequency surface-relief grating on a lossy substrate.

作者信息

Glytsis E N, Gaylord T K

出版信息

Appl Opt. 1988 Oct 15;27(20):4288-304. doi: 10.1364/AO.27.004288.

DOI:10.1364/AO.27.004288
PMID:20539558
Abstract

With proper design, a dielectric (or lossy) overcoated high spatial-frequency rectangular-groove grating on a lossy substrate can exhibit zero reflectivity. A procedure for designing these structures based on impedance matching and the effective index of the grating in the long wavelength limit is presented. The needed filling factor and groove depth of the grating to produce antireflection behavior are calculated for a given complex index of refraction of the substrate and index and thickness of the coating layer. The analysis is applicable to any wavelength and angle of incidence and for either TE or TM polarization. It is shown that multiple zeroreflectivity solutions occur. Necessary and sufficient conditions for zero-reflectivity solutions are derived in the appropriate parameter space. The analysis is also extended to multiple dielectric (or lossy) overlayers. Since the treatment is based on the equivalence of the grating to a lossy layer in the long wavelength limit, the treatment also includes as an intermediate step the design of a dielectric (or lossy) overcoated homogeneous lossy layer on a lossy substrate. The designs of zero-reflectivity gold gratings overcoated by a single dielectric layer are presented for wavelengths in the 0.44-12.0-microm range. The sensitivity of these resulting structures to changes in the angle of incidence, the coating thickness, the coating index, the filling factor, and the groove depth are presented. Furthermore, the design of dielectric overcoated gold gratings that are simultaneously antireflecting for both TE and TM polarizations is presented.

摘要

通过适当设计,在有损衬底上的电介质(或有损)包覆的高空间频率矩形槽光栅可以呈现零反射率。本文提出了一种基于阻抗匹配和长波长极限下光栅有效折射率来设计这些结构的方法。针对给定的衬底复折射率、涂层折射率和厚度,计算出产生抗反射行为所需的光栅填充因子和槽深。该分析适用于任何波长和入射角,以及TE或TM偏振。结果表明存在多个零反射率解。在适当的参数空间中推导了零反射率解的充要条件。该分析还扩展到多个电介质(或有损)覆盖层。由于该处理基于长波长极限下光栅与有损层的等效性,该处理还包括作为中间步骤的在有损衬底上设计电介质(或有损)包覆的均匀有损层。给出了在0.44 - 12.0微米范围内波长下单电介质层包覆的零反射率金光栅的设计。介绍了这些所得结构对入射角、涂层厚度、涂层折射率、填充因子和槽深变化的敏感性。此外,还给出了对TE和TM偏振同时具有抗反射性的电介质包覆金光栅的设计。

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Appl Opt. 1988 Oct 15;27(20):4288-304. doi: 10.1364/AO.27.004288.
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