优化电子束蒸发TiO₂薄膜的沉积参数。
Optimizing deposition parameters of electron beam evaporated TiO(2) films.
作者信息
Lehmann H W, Frick K
出版信息
Appl Opt. 1988 Dec 1;27(23):4920-4. doi: 10.1364/AO.27.004920.
PMID:20539675
Abstract
A study of the major deposition parameters including source material, oxygen partial pressure, substrate temperature, and deposition rate affecting the optical quality of electron beam evaporated TiO(2) films is presented. After careful optimization of these parameters it is possible to reproducibly deposit TiO(2) films from TiO(2) source material mixed with 5% CeO(2) at an oxygen partial pressure of 5 x 10(-5) Torr, a substrate temperature of 320 degrees C, and a deposition rate of 2 A/s.
摘要
本文介绍了一项关于影响电子束蒸发TiO₂薄膜光学质量的主要沉积参数的研究，这些参数包括源材料、氧分压、衬底温度和沉积速率。在对这些参数进行仔细优化后，可以在氧分压为5×10⁻⁵托、衬底温度为320℃、沉积速率为2埃/秒的条件下，从混合了5% CeO₂的TiO₂源材料中可重复地沉积TiO₂薄膜。
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