Mixed films of TiO(2)-SiO(2) deposited by double electron-beam coevaporation.

We used double electron-beam coevaporation to fabricate TiO(2)-SiO(2) mixed films. The deposition process included oxygen partial pressure, substrate temperature, and deposition rate, all of which were real-time computer controlled. The optical properties of the mixed films varied from pure SiO(2) to pure TiO(2) as the composition of the films varied accordingly. X-ray diffraction showed that the mixed films all have amorphous structure with a SiO(2) content of as low as 11%. Atomic force microscopy showed that the mixed film has a smoother surface than pure TiO(2) film because of its amorphous structure.

Linear and Bruggeman's effective medium approximation models fit the experimental data better than other models.