Alehyane N, Arbaoui M, Barchewitz R, André J M, Christensen F E, Hornstrup A, Palmari J, Rasigni M, Rivoira R, Rasigni G
Appl Opt. 1989 May 15;28(10):1763-72. doi: 10.1364/AO.28.001763.
XUV and x-ray scattering by a LiF crystal is measured. The angular distribution of the scattered radiation (ADSR) reveals characteristic features, side peaks or asymmetry. The surface of the sample is statistically characterized by a microdensitometer analysis of electron micrographs resolving the short spatial wavelengths of the surface roughness. This analysis shows that the surface has a large microroughness with an autocovariance function which is Gaussian in its initial portion. The first-order perturbation vector theory of the roughness-induced scattering leads to an interpretation of the ADSR features in terms of the modulation of the surface power spectral density function associated with the microroughness by an optical factor. The possibility of obtaining short scale roughness characterization from XUV or x-ray measurements is discussed.
测量了LiF晶体对极紫外光（XUV）和X射线的散射。散射辐射的角分布（ADSR）呈现出特征性特征、边峰或不对称性。通过对电子显微镜照片进行显微密度计分析来统计表征样品表面，该分析可分辨表面粗糙度的短空间波长。分析表明，表面具有较大的微观粗糙度，其自协方差函数在初始部分呈高斯分布。粗糙度诱导散射的一阶微扰矢量理论导致根据与微观粗糙度相关的表面功率谱密度函数通过光学因子的调制来解释ADSR特征。讨论了从极紫外光或X射线测量中获得短尺度粗糙度表征的可能性。
