Liu Xikui, Stamm Manfred
Nanoscale Res Lett. 2009 Feb 19;4(5):459-464. doi: 10.1007/s11671-009-9263-4.
Realizing the vast technological potential of patternable block copolymers requires both the precise controlling of the orientation and long-range ordering, which is still a challenging topic so far. Recently, we have demonstrated that ordered nanoporous thin film can be fabricated from a simple supramolecular assembly approach. Here we will extend this approach and provide a general route to fabricate large areas of highly ordered polymeric nanodot and nanowire arrays. We revealed that under a mixture solvent annealing atmosphere, a near-defect-free nanoporous thin film over large areas can be achieved. Under the direction of interpolymer hydrogen bonding and capillary action of nanopores, this ordered porous nanotemplate can be properly filled with phenolic resin precursor, followed by curation and pyrolysis at middle temperature to remove the nanotemplate, a perfect ordered polymer nanodot arrays replication was obtained. The orientation of the supramolecular assembly thin films can be readily re-aligned parallel to the substrate upon exposure to chloroform vapor, so this facile nanotemplate replica method can be further extend to generate large areas of polymeric nanowire arrays. Thus, we achieved a successful sub-30 nm patterns nanotemplates transfer methodology for fabricating polymeric nanopattern arrays with highly ordered structure and tunable morphologies.
要实现可图案化嵌段共聚物巨大的技术潜力，需要精确控制其取向和长程有序性，而这至今仍是一个具有挑战性的课题。最近，我们已经证明可以通过一种简单的超分子组装方法制备有序纳米多孔薄膜。在此，我们将扩展这种方法，并提供一种制备大面积高度有序聚合物纳米点和纳米线阵列的通用途径。我们发现，在混合溶剂退火气氛下，可以获得大面积的近无缺陷纳米多孔薄膜。在聚合物间氢键作用和纳米孔的毛细作用引导下，这种有序多孔纳米模板可以用酚醛树脂前驱体适当填充，随后进行固化和中温热解以去除纳米模板，从而获得完美的有序聚合物纳米点阵列复制品。超分子组装薄膜的取向在暴露于氯仿蒸汽时可以很容易地重新排列成与基底平行，因此这种简便的纳米模板复制方法可以进一步扩展以制备大面积的聚合物纳米线阵列。因此，我们实现了一种成功的亚30纳米图案纳米模板转移方法，用于制备具有高度有序结构和可调形态的聚合物纳米图案阵列。
