SH 和 CH3 封端自组装单层的二进制混合物控制定向金纳米粒子之间的平均间距。
Binary Mixtures of SH- and CH3-Terminated Self-Assembled Monolayers to Control the Average Spacing Between Aligned Gold Nanoparticles.
机构信息
Department of Physics and Astronomy, The University of Western Ontario, London, ON, N6A 3K7, Canada.
出版信息
Nanoscale Res Lett. 2009 Aug 2;4(11):1319-23. doi: 10.1007/s11671-009-9399-2.
This paper presents a method to control the average spacing between organometallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs) in a line. Focused ion beam patterned CH3-terminated self-assembled monolayers are refilled systematically with different mixtures of SH- and CH3-terminated silanes. The average spacing between OMCVD Au NPs is demonstrated systematically to decrease by increasing the v/v% ratio of the thiols in the binary silane mixtures with SH- and CH3-terminated groups.
本文提出了一种控制有机金属化学气相沉积（OMCVD）生长的金纳米粒子（Au NPs）在直线上平均间距的方法。通过聚焦离子束图案化的 CH3 端自组装单层，系统地用不同比例的 SH 和 CH3 端硅烷混合物进行再填充。结果表明，随着 SH 和 CH3 端基团二元硅烷混合物中硫醇的 v/v%比例增加，OMCVD Au NPs 的平均间距呈系统下降趋势。
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