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抗菌氟喹诺酮类药物鲁氟沙星诱导的光致敏作用导致酵母的突变。

Photosensitization induced by the antibacterial fluoroquinolone Rufloxacin leads to mutagenesis in yeast.

机构信息

Institut Curie, Centre de Recherche, Centre Universitaire, F-91405 Orsay, France.

出版信息

Mutat Res. 2010 Oct 13;692(1-2):34-41. doi: 10.1016/j.mrfmmm.2010.07.011. Epub 2010 Aug 7.

DOI:10.1016/j.mrfmmm.2010.07.011
PMID:20696178
Abstract

Rufloxacin (RFX) is an antibacterial fluoroquinolone that exhibits UVA photosensitization properties. Photosensitization reactions lead to the formation of oxidative damage, mainly via singlet oxygen. Here we explore the phototoxic and photomutagenic potency of RFX using a panel of yeast (Saccharomyces cerevisiae) mutants affected in different DNA repair pathways. Yeast mutants provide a sensitive tool to identify the photodamage and the DNA repair pathways that cope with it. Cell viability test at increasing dose of UVA shows that both the DNA repair deficient and wild type cells are equally sensitive to RFX-induced photosensitization, demonstrating that phototoxic effect is not due to DNA injury. Photomutagenicity of RFX is evaluated by measuring the frequency of forward Can(R) mutations. The mutation induction is low in wild type cells. A high increase in mutation frequency is observed in strains affected in Ogg1 gene, compared to wild type and other base excision repair deficient strains. The mutation spectrum photomediated by RFX in wild type cells reveals a bias in favour of GC>TA transversions, whereas transition and frameshift mutations are less represented. Altogether data demonstrates that 8-oxo-7,8-dihydroguanine (8-oxoGua) is by far the major DNA damage produced by RFX photosensitization, leading to mutagenesis. We also explore the role played by DNA mismatch repair, translesion synthesis and post-replication repair in the prevention of mutagenic effects due to RFX exposure. In addition, we show that most of RFX photodegradation products are not mutagenic. This study defines the phototoxic and photomutagenic properties of antibacterial RFX and point out possible unwanted side effects in skin under sunlight.

摘要

氧氟沙星(RFX)是一种具有 UVA 光敏特性的抗菌氟喹诺酮类药物。光敏反应会导致氧化损伤的形成,主要是通过单线态氧。在这里,我们使用一组不同 DNA 修复途径受到影响的酵母(酿酒酵母)突变体来探索 RFX 的光毒性和光致突变性。酵母突变体提供了一种敏感的工具,可以识别光损伤和应对光损伤的 DNA 修复途径。在增加的 UVA 剂量下进行细胞活力测试表明,DNA 修复缺陷和野生型细胞对 RFX 诱导的光敏化同样敏感,这表明光毒性效应不是由于 DNA 损伤引起的。通过测量正向 Can(R)突变的频率来评估 RFX 的光致突变性。野生型细胞中的突变诱导率较低。与野生型和其他碱基切除修复缺陷菌株相比,Ogg1 基因缺陷菌株中的突变频率显着增加。RFX 在野生型细胞中介导的突变谱揭示了 GC>TA 颠换的偏向性,而转换和移码突变的代表性较低。总的来说,数据表明 8-氧代-7,8-二氢鸟嘌呤(8-oxoGua)是 RFX 光敏化产生的主要 DNA 损伤,导致突变。我们还探讨了 DNA 错配修复、跨损伤合成和复制后修复在预防由于 RFX 暴露引起的诱变作用中的作用。此外,我们表明,大多数 RFX 光降解产物没有致突变性。本研究定义了抗菌 RFX 的光毒性和光致突变性,并指出在阳光照射下皮肤可能会出现不必要的副作用。

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