低能聚焦电子束加工形成的纳米孔。

Nanopore formation by low-energy focused electron beam machining.

机构信息

Micro Instruments and Systems Laboratory (MISL), University of Maine, Orono, ME, USA.

出版信息

Nanotechnology. 2010 Sep 17;21(37):375301. doi: 10.1088/0957-4484/21/37/375301. Epub 2010 Aug 17.

PMID:20714050

Abstract

The fabrication of nanopores in thin silicon nitride and aluminum oxide membranes by water vapor assisted, low-energy (0.2-20 kV) electron beam machining using a scanning electron microscope (SEM) is described. Using this technique, pores with diameters ranging in size from < 5 to 20 nm are easily formed. The nanopores are characterized by SEM, transmission electron microscopy (TEM) and atomic force microscopy (AFM). The mechanism of etching is briefly discussed.

摘要

采用扫描电子显微镜（SEM），通过水汽辅助、低能（0.2-20 kV）电子束加工技术在薄氮化硅和氧化铝膜中制造纳米孔，本文对此进行了描述。利用该技术，很容易形成直径在 5 到 20nm 之间的纳米孔。通过 SEM、透射电子显微镜（TEM）和原子力显微镜（AFM）对纳米孔进行了表征。还简要讨论了刻蚀机理。