Centre Suisse d'Electronique et de Microtechnique SA, Jaquet Droz 1, CH-2000 Neuchâtel, Switzerland.
Nanotechnology. 2009 Dec 2;20(48):485303. doi: 10.1088/0957-4484/20/48/485303. Epub 2009 Oct 30.
Here we show a method for patterning a thin metal film using self-assembled block-copolymer micelles monolayers as a template. The obtained metallic mask is transferred by reactive ion etching in silicon oxide, silicon and silicon nitride substrates, thus fabricating arrays of hexagonally packed nanopores with tunable diameters, interspacing and aspect ratios. This technology is compatible with integration into a standard microtechnology sequence for wafer-scale fabrication of ultrathin silicon nitride nanoporous membranes with 80 nm mean pore diameter.
在这里，我们展示了一种使用自组装的嵌段共聚物胶束单层作为模板来图案化薄金属膜的方法。通过反应离子刻蚀将获得的金属掩模转移到氧化硅、硅和氮化硅衬底上，从而制造出具有可调节直径、间隔和纵横比的六边形排列的纳米孔阵列。这项技术与集成到标准微技术序列兼容，可用于在硅片规模上制造具有 80nm 平均孔径的超薄氮化硅纳米多孔膜。
