Leistner A J, Thwaite E G, Lesha F, Bennett J M
Appl Opt. 1992 Apr 1;31(10):1472-82. doi: 10.1364/AO.31.001472.
Teflon polishing is compared with pitch polishing as a method for achieving supersmooth and flat optical surfaces. Because a Teflon lap wears slowly, it will retain its surface shape to produce extremely flat optical surfaces, lambda/100, consistently and reliably for extended periods of time, of the order of days. To compare the two methods, we polished 50-mm-diameter samples of various optical materials, using colloidal suspensions in water on both pitch and Teflon laps under the same polishing conditions. Flatness was maintained to better than lambda/10, and roughness less than 10 A rms was measured on all samples by two Talystep surface-profiling instruments, one in the United States and one in Australia, with excellent agreement between measurements made by the two instruments. It was possible to obtain flat andsmooth surfaces (<4-A rms roughness) on all materials (except for F4, flint glass), but only certain combinations of material, abrasive, and lap could be used to give the correct polishing conditions and s rface chemistry.
作为一种实现超光滑和平整光学表面的方法，将特氟龙抛光与沥青抛光进行了比较。由于特氟龙研磨盘磨损缓慢，它将保持其表面形状，以便长时间（数天左右）持续且可靠地生产出极其平整的光学表面，平整度达到λ/100。为了比较这两种方法，我们在相同的抛光条件下，使用水基胶体悬浮液在沥青和特氟龙研磨盘上对各种光学材料的50毫米直径样品进行了抛光。所有样品的平整度均保持在优于λ/10的水平，并且通过美国和澳大利亚的两台泰利斯泰普表面轮廓仪测量，所有样品的粗糙度均小于10 Å均方根，两台仪器的测量结果吻合良好。除了F4火石玻璃外，在所有材料上都有可能获得平整光滑的表面（粗糙度均方根<4 Å），但只有特定的材料、磨料和研磨盘组合才能用于提供正确的抛光条件和表面化学性质。
