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使用聚四氟乙烯和沥青研磨盘进行抛光研究以制造平整和超光滑表面。

Polishing study using Teflon and pitch laps to produce flat and supersmooth surfaces.

作者信息

Leistner A J, Thwaite E G, Lesha F, Bennett J M

出版信息

Appl Opt. 1992 Apr 1;31(10):1472-82. doi: 10.1364/AO.31.001472.

Abstract

Teflon polishing is compared with pitch polishing as a method for achieving supersmooth and flat optical surfaces. Because a Teflon lap wears slowly, it will retain its surface shape to produce extremely flat optical surfaces, lambda/100, consistently and reliably for extended periods of time, of the order of days. To compare the two methods, we polished 50-mm-diameter samples of various optical materials, using colloidal suspensions in water on both pitch and Teflon laps under the same polishing conditions. Flatness was maintained to better than lambda/10, and roughness less than 10 A rms was measured on all samples by two Talystep surface-profiling instruments, one in the United States and one in Australia, with excellent agreement between measurements made by the two instruments. It was possible to obtain flat andsmooth surfaces (<4-A rms roughness) on all materials (except for F4, flint glass), but only certain combinations of material, abrasive, and lap could be used to give the correct polishing conditions and s rface chemistry.

摘要

作为一种实现超光滑和平整光学表面的方法,将特氟龙抛光与沥青抛光进行了比较。由于特氟龙研磨盘磨损缓慢,它将保持其表面形状,以便长时间(数天左右)持续且可靠地生产出极其平整的光学表面,平整度达到λ/100。为了比较这两种方法,我们在相同的抛光条件下,使用水基胶体悬浮液在沥青和特氟龙研磨盘上对各种光学材料的50毫米直径样品进行了抛光。所有样品的平整度均保持在优于λ/10的水平,并且通过美国和澳大利亚的两台泰利斯泰普表面轮廓仪测量,所有样品的粗糙度均小于10 Å均方根,两台仪器的测量结果吻合良好。除了F4火石玻璃外,在所有材料上都有可能获得平整光滑的表面(粗糙度均方根<4 Å),但只有特定的材料、磨料和研磨盘组合才能用于提供正确的抛光条件和表面化学性质。

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