Köhler Robert, Hellrung Domenico, Tasche Daniel, Gerhard Christoph
Faculty of Engineering and Health, HAWK University of Applied Sciences and Arts, Von-Ossietzky-Str. 99/100, 37085 Göttingen, Germany.
Faculty of Natural and Materials Science, Clausthal University of Technology, Robert-Koch-Straße 42, 38678 Clausthal-Zellerfeld, Germany.
Materials (Basel). 2021 Mar 26;14(7):1620. doi: 10.3390/ma14071620.
The chemical composition of ground and polished fused silica glass surfaces plays a decisive role in different applications of optics. In particular, a high level of carbon impurities is often undesirable for further processing and especially for gluing or cementing where adhesion failure may be attributed to carbonic surface-adherent contaminants. In this study, the surface carbon content at different stages of classical optics manufacturing was thus investigated. Two different standard processes-grinding and lapping with two final polishing processes using both polyurethane and pitch pads-were considered. After each process step, the chemical composition and roughness of the surface were analysed using X-ray photoelectron spectroscopy and atomic force microscopy. An obvious correlation between surface roughness and effective surface area, respectively, and the proportion of carbon contamination was observed. The lowest carbon contamination was found in case of lapped and pitch polished surfaces.
研磨和抛光后的熔融石英玻璃表面的化学成分在光学的不同应用中起着决定性作用。特别是，高水平的碳杂质通常不利于进一步加工，尤其是在胶合或粘结时，粘附失败可能归因于碳酸表面附着污染物。因此，在本研究中，对经典光学制造不同阶段的表面碳含量进行了研究。考虑了两种不同的标准工艺——研磨和研磨，以及两种使用聚氨酯和沥青垫的最终抛光工艺。在每个工艺步骤之后，使用X射线光电子能谱和原子力显微镜分析表面的化学成分和粗糙度。观察到表面粗糙度和有效表面积与碳污染比例之间存在明显的相关性。在研磨和沥青抛光表面的情况下，发现碳污染最低。
