Bates K A, Li L, Roncone R L, Burke J J
Appl Opt. 1993 Apr 20;32(12):2112-6. doi: 10.1364/AO.32.002112.
Analysis, fabrication, and characterization of variable groove depth planar waveguide grating couplers are presented. A formula is derived to describe the grating groove depth variation necessary to produce an outcoupled beam of arbitrary profile. A variable depth grating for producing a Gaussian beam profile is fabricated on a waveguide by ion-beam etching through a scanning slit apparatus. A photoresist grating placed on the waveguide provides a mask to define the grating etched onto the waveguide. The near-field irradiance of the outcoupled beam is measured and shown to approach a Gaussian profile.
本文介绍了可变槽深平面波导光栅耦合器的分析、制作及特性表征。推导了一个公式,用于描述产生任意形状出射光束所需的光栅槽深变化。通过离子束蚀刻,利用扫描狭缝装置在波导上制作了用于产生高斯光束形状的可变深度光栅。置于波导上的光刻胶光栅提供了一个掩膜,用于定义蚀刻在波导上的光栅。测量了出射光束的近场辐照度,结果表明其接近高斯分布。