Rönnow D, Bergkvist M, Roos A, Ribbing C G
Appl Opt. 1993 Jul 1;32(19):3448-51. doi: 10.1364/AO.32.003448.
A spectroscopic total-integrated-scatter instrument has been constructed. It uses a Coblentz sphere for the collection of the scattered light and a lamp with a monochromator as a light source. It can be used to measure diffuse reflectance as well as transmittance. The instrument has been used to measure diffuse reflectance of thermally and chemical-vapor-deposition oxidized silicon wafers. Comparisons are made with measurements by using a spectrophotometer with an integrating sphere. The data have been interpreted with a parameterized model for light scattering from a double layer, to obtain rms surfaceroughness values for the two interfaces of the oxide film.
