Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven, The Netherlands.
J Am Chem Soc. 2010 Oct 6;132(39):13776-81. doi: 10.1021/ja1045555.
The application of doping in semiconductors plays a major role in the high performances achieved to date in inorganic devices. In contrast, doping has yet to make such an impact in organic electronics. One organic device that does make extensive use of doping is the light-emitting electrochemical cell (LEC), where the presence of mobile ions enables dynamic doping, which enhances carrier injection and facilitates relatively large current densities. The mechanism and effects of doping in LECs are, however, still far from being fully understood, as evidenced by the existence of two competing models that seem physically distinct: the electrochemical doping model and the electrodynamic model. Both models are supported by experimental data and numerical modeling. Here, we show that these models are essentially limits of one master model, separated by different rates of carrier injection. For ohmic nonlimited injection, a dynamic p-n junction is formed, which is absent in injection-limited devices. This unification is demonstrated by both numerical calculations and measured surface potentials as well as light emission and doping profiles in operational devices. An analytical analysis yields an upper limit for the ratio of drift and diffusion currents, having major consequences on the maximum current density through this type of device.
掺杂在半导体中的应用在无机器件中实现的高性能方面发挥了重要作用。相比之下,掺杂在有机电子学中尚未产生如此大的影响。一种广泛应用掺杂的有机器件是发光电化学池(LEC),其中存在可移动离子可实现动态掺杂,从而增强载流子注入并促进相对较大的电流密度。然而,掺杂在 LEC 中的机制和效果远未被完全理解,这两个竞争模型似乎在物理上存在明显区别:电化学掺杂模型和电动模型。这两个模型都得到了实验数据和数值建模的支持。在这里,我们表明这些模型本质上是由不同的载流子注入速率分离的一个主模型的极限。对于欧姆非限制注入,形成了动态 p-n 结,而在注入限制器件中则不存在该结。这种统一通过数值计算以及在工作器件中的测量表面势以及光发射和掺杂分布得到证明。分析分析得出漂移和扩散电流之比的上限,这对通过这种类型的器件的最大电流密度有重大影响。