Hawryluk A M, Ceglio N M
Appl Opt. 1993 Dec 1;32(34):7062-7. doi: 10.1364/AO.32.007062.
The choice of the operational wavelength for a soft-x-ray projection lithography system affects a wide variety of system parameters such as optical design, sources, resists, and multilayer mirrors. Several system constraints limit the choice for the operational wavelength. In particular, optical imaging requirements place an upper limit and throughput issues place a lower limit on the wavelength selection. We have determined that there are several discrete wavelength regions between 10 and 25 nm that satisfy the system-imposed constraints of high resolution, large depth of focus, and high throughput.
软X射线投影光刻系统工作波长的选择会影响多种系统参数，如光学设计、光源、光刻胶和多层镜。若干系统限制因素制约了工作波长的选择。特别是，光学成像要求为波长设定了上限，而吞吐量问题则为波长选择设定了下限。我们已经确定，在10至25纳米之间有几个离散的波长区域能够满足系统对高分辨率、大焦深和高吞吐量的要求。
