Department of Physical Chemistry, University of Science and Technology Beijing, Beijing, 100083, PR China.
Dalton Trans. 2010 Nov 7;39(41):9952-5. doi: 10.1039/c0dt00681e. Epub 2010 Sep 27.
Single phase Pb(Ti(0.8)Fe(0.2))O(3-δ) thin films with a thickness of 210 nm and 120 nm were fabricated on Pt/Ti/SiO(2)/Si substrate by a chemical solution deposition technique. The thin film with a thickness of 210 nm showed a homogeneous microstructure, low porosity, low oxygen vacancies, and preferred orientation. It had negligible leakage current and well saturated ferroelectric hysteresis loop compared with the Pb(Ti(0.8)Fe(0.2))O(3-δ) bulk sample. Polarization fatigue characteristic indicated that this film has a potential application as a switcher in some electrical devices. The saturation magnetization in the Fe-doped PbTiO(3) film is weaker than that for bulk sample, and its ferromagnetism is correlated to the F-center exchange (FCE) mechanism. The present results revealed the multiferroic nature of the Pb(Ti(0.8)Fe(0.2))O(3-δ) thin film.
采用化学溶液沉积技术在 Pt/Ti/SiO2/Si 衬底上制备了厚度分别为 210nm 和 120nm 的单相 Pb(Ti0.8Fe0.2)O3-δ 薄膜。厚度为 210nm 的薄膜具有均匀的微观结构、低孔隙率、低氧空位和择优取向。与 Pb(Ti0.8Fe0.2)O3 体样相比,其漏电流可忽略不计,铁电滞后回线饱和。极化疲劳特性表明,该薄膜作为某些电子器件中的开关具有潜在的应用前景。Fe 掺杂 PbTiO3 薄膜的饱和磁化强度弱于体样,其铁磁性与 F 中心交换(FCE)机制有关。研究结果表明 Pb(Ti0.8Fe0.2)O3-δ 薄膜具有多铁性。