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新型 N-杂芳基硼烷衍生的硼自由基:生成与反应活性。

New boryl radicals derived from N-heteroaryl boranes: generation and reactivity.

机构信息

Department of Photochemistry, UMR CNRS 7525, University of Haute Alsace, ENSCMu, 3 rue Alfred Werner, 68093 Mulhouse Cedex, France.

出版信息

Chemistry. 2010 Nov 15;16(43):12920-7. doi: 10.1002/chem.201001440.

Abstract

Recently, boryl radicals have been the subject of revived interest. These structures were generated by hydrogen-abstraction reactions from the corresponding boranes (i.e., from amine or phosphine boranes). However, the classical issue remains their high B--H bond-dissociation energy (BDE), thereby preventing a very efficient hydrogen-abstraction process. In the present paper, new N-heteroaryl boranes that exhibiting low B--H BDE are presented; excellent hydrogen-transfer properties have been found. Both the generation and the reactivity of the associated boryl radicals have been investigated through their direct observation in laser flash photolysis. The boryl radical interactions with double bonds, oxygen, oxidizing agent, and alkyl halides have been studied. Some selected applications of N-heteroaryl boryl radicals as new polymerization-initiating structures are proposed to evidence their high intrinsic reactivity.

摘要

最近,硼自由基重新引起了人们的兴趣。这些结构是通过从相应的硼烷(即胺或膦硼烷)中进行氢提取反应生成的。然而,经典问题仍然是它们的高 B-H 键离解能(BDE),从而阻止了非常有效的氢提取过程。在本文中,提出了具有低 B-H BDE 的新型 N-杂芳基硼烷;发现了优异的氢转移性质。通过激光闪光光解直接观察,研究了相关硼自由基的生成和反应性。研究了硼自由基与双键、氧、氧化剂和卤代烷基的相互作用。提出了 N-杂芳基硼自由基作为新的聚合引发结构的一些选定应用,以证明其高固有反应性。

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