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苯乙炔在氢终止的 Si(111)和 Si(100)表面的键合结构:表面光电子能谱分析和从头算计算。

Bonding structure of phenylacetylene on hydrogen-terminated Si(111) and Si(100): surface photoelectron spectroscopy analysis and ab initio calculations.

机构信息

Chisso Corporation, 2-2-1, Otemachi, Chiyoda-ku, Tokyo 100-8105, Japan.

出版信息

Langmuir. 2010 Nov 16;26(22):17000-12. doi: 10.1021/la103208n. Epub 2010 Sep 30.

Abstract

Interfaces between phenylacetylene (PA) monolayers and two silicon surfaces, Si(111) and Si(100), are probed by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and near-edge X-ray absorption fine structure (NEXAFS) spectroscopy, and the results are analyzed using ab initio molecular orbital calculations. The monolayer systems are prepared via the surface hydrosilylation reaction between PA and hydrogen-terminated silicon surfaces. The following spectral features are obtained for both of the PA-Si(111) and PA-Si(100) systems: a broad π-π* shakeup peak at 292 eV (XPS), a broad first ionization peak at 3.8 eV (UPS), and a low-energy C 1s → π* resonance peak at 284.3 eV (NEXAFS). These findings are ascribed to a styrene-like π-conjugated molecular structure at the PA-Si interface by comparing the experimental data with theoretical analysis results. A conclusion is drawn that the vinyl group can keep its π-conjugation character on the hydrogen-terminated Si(100) [H:Si(100)] surface composed of the dihydride (SiH(2)) groups as well as on hydrogen-terminated Si(111) having the monohydride (SiH) group. The formation mechanism of the PA-Si(100) interface is investigated within cluster ab initio calculations, and the possible structure of the H:Si(100) surface is discussed based on available data.

摘要

通过 X 射线光电子能谱(XPS)、紫外光电子能谱(UPS)和近边 X 射线吸收精细结构(NEXAFS)光谱研究了苯乙炔(PA)单层与两种硅表面(Si(111)和 Si(100))之间的界面,并用从头算分子轨道计算对结果进行了分析。单层体系是通过 PA 与氢终止硅表面之间的表面硅氢反应制备的。对于 PA-Si(111)和 PA-Si(100)体系,得到了以下光谱特征:292 eV 的宽π-π* shakeup 峰(XPS)、3.8 eV 的宽第一电离峰(UPS)和 284.3 eV 的低能 C 1s→π*共振峰(NEXAFS)。通过将实验数据与理论分析结果进行比较,将这些发现归因于 PA-Si 界面处的类似于苯乙烯的π共轭分子结构。得出结论,在由二氢化物(SiH(2))基团组成的氢终止 Si(100)[H:Si(100)]表面以及具有单氢化物(SiH)基团的氢终止 Si(111)上,乙烯基基团可以保持其π共轭特性。通过团簇从头算计算研究了 PA-Si(100)界面的形成机制,并根据现有数据讨论了 H:Si(100)表面的可能结构。

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