光笔：一种简单且用途广泛的无掩模光刻工具。
Photo-pens: a simple and versatile tool for maskless photolithography.
机构信息
Department of Chemistry & Biochemistry, Southern Illinois University, Carbondale, Illinois 62901, USA.
出版信息
Langmuir. 2010 Nov 16;26(22):17726-32. doi: 10.1021/la1028433. Epub 2010 Oct 1.
We demonstrate conical pores etched in tracked glass chips for fabricating patterns at the micrometer scale. Highly fluorescent patterns based on photopolymerization of diacetylene films were formed by irradiating UV light through conical pores called "photo-pens". The properties of photopens were investigated through experiments, finite-difference-time-domain (FDTD) simulations and numerical calculations based on Fresnel equations. We show that the pattern dimensions are easily controlled by adjusting the exposure time. Thus, patterns with a range of dimensions can be fabricated without any need of changes in the pore diameter. Parallel patterning was also demonstrated by simultaneously exposing the films to photons through multiple pores in the chip. Our method provides an inexpensive, versatile, and efficient way for patterning without the use of sophisticated masks.
我们展示了在刻蚀有锥形孔的微通道玻璃芯片上进行微米尺度图案制作的方法。通过在锥形孔（称为“光笔”）中照射紫外光，使二炔薄膜进行光聚合反应，从而形成具有高度荧光性的图案。我们通过实验、有限差分时间域（FDTD）模拟以及基于菲涅耳方程的数值计算研究了光笔的特性。实验结果表明，通过调整曝光时间可以轻松控制图案的尺寸。因此，无需改变孔径就可以制作具有各种尺寸的图案。我们还通过同时使用芯片上的多个孔向薄膜照射光子，实现了平行图案化。我们的方法为无复杂掩模的图案化提供了一种经济、通用且高效的方法。
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