M³：基于显微镜的无掩模干膜光刻技术。
M³: Microscope-based maskless micropatterning with dry film photoresist.
机构信息
Department of Biomedical Engineering, Stony Brook University, Stony Brook, NY 11794-8181, USA.
出版信息
Biomed Microdevices. 2011 Apr;13(2):375-81. doi: 10.1007/s10544-010-9506-2.
Abstract
We present a maskless micropatterning system that utilizes a fluorescence microscope with programmable X-Y stage and dry film photoresist to realize feature sizes in the sub-millimeter range (40-700 μm). The method allows for flexible in-house maskless photolithography without a dedicated microfabrication facility and is well-suited for rapid prototyping of microfluidic channels, scaffold templates for protein/cell patterning or optically-guided cell encapsulation for biomedical applications.
摘要
我们提出了一种无掩模微图案化系统，该系统利用带有可编程 X-Y 工作台的荧光显微镜和干膜光致抗蚀剂，实现亚毫米级（40-700 μm）的特征尺寸。该方法无需专用微加工设备即可实现灵活的内部无掩模光刻，非常适合用于快速制作微流道、用于蛋白质/细胞图案化的支架模板或用于生物医学应用的光学引导细胞封装。
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